SK hynix adopts next-generation ASML production equipment for DRAM

Korea's No. 2 chipmaker SK hynix said Wednesday it has adopted advanced production equipment at a domestic memory production line to accelerate the development of next-generation chips. The company said it has installed the industry's first High Numerical Aperture Extreme Ultraviolet (High NA EUV) lithography system at its M16 chip fabrication plant, located at its main production base in Icheon, south of Seoul. High NA EUV refers to an advanced lithography system that delivers better resolution by applying a larger numerical aperture, which measures an optical system's ability to collect light. The equipment, produced by the Netherlands-based ASML, offers a 40 percent improvement in numerical aperture, along with 1.7 times higher precision, according to the company. SK hynix said the system is expected to accelerate the development of its next-generation memory products. "We expect the addition of the critical infrastructure to bring our technological vision we have been pursuing into reality," said Cha Seon-yong, who heads the company's research and development. "We aim to enhance our leWeiter zum vollständigen Artikel bei Korea Times Weiter zum vollständigen Artikel bei Korea Times